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BEGIN:VEVENT
DTSTAMP:20250110T023312Z
LOCATION:Hall B5 (1)\, B Block\, Level 5
DTSTART;TZID=Asia/Tokyo:20241205T104500
DTEND;TZID=Asia/Tokyo:20241205T105900
UID:siggraphasia_SIGGRAPH Asia 2024_sess127_papers_448@linklings.com
SUMMARY:Inverse Rendering for Tomographic Volumetric Additive Manufacturin
 g
DESCRIPTION:Technical Papers\n\nBaptiste Nicolet, Felix Wechsler, Jorge Ma
 drid-Wolff, Christophe Moser, and Wenzel Jakob (EPFL)\n\nTomographic Volum
 etric Additive Manufacturing (TVAM) is an emerging 3D printing technology 
 that can create complex objects in under a minute. The key idea is to proj
 ect intense light patterns onto a rotating vial of photo-sensitive resin, 
 causing polymerization where the cumulative dose\nof these patterns reache
 s the polymerization threshold. We formulate the pattern calculation as an
  inverse light transport problem and solve it via physically based differe
 ntiable rendering. In doing so, we address long-standing limitations of pr
 ior work by accurately modeling and correcting\nfor scattering in composit
 e resins, printing in non-symmetric vials, and supporting unusual printing
  geometries. We also introduce an improved discretization scheme that expl
 oits the ray tracing operation to mitigate resolution-related artifacts in
  prints. We demonstrate the benefits of our\nmethod in real-world experime
 nts, where our computed patterns produce prints with an improved fidelity.
 \n\nRegistration Category: Full Access, Full Access Supporter\n\nLanguage 
 Format: English Language\n\nSession Chair: Lin Lu (Shandong University)
URL:https://asia.siggraph.org/2024/program/?id=papers_448&sess=sess127
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