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X-LIC-LOCATION:Asia/Tokyo
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TZOFFSETFROM:+0900
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DTSTAMP:20260817T171530Z
LOCATION:Hall B5 (1)\, B Block\, Level 5
DTSTART;TZID=Asia/Tokyo:20241205T104500
DTEND;TZID=Asia/Tokyo:20241205T105900
UID:siggraphasia_SIGGRAPH Asia 2024_sess127_papers_448@linklings.com
SUMMARY:Inverse Rendering for Tomographic Volumetric Additive Manufacturin
 g
DESCRIPTION:Baptiste Nicolet, Felix Wechsler, Jorge Madrid-Wolff, Christop
 he Moser, and Wenzel Jakob (EPFL)\n\nTomographic Volumetric Additive Manuf
 acturing (TVAM) is an emerging 3D printing technology that can create comp
 lex objects in under a minute. The key idea is to project intense light pa
 tterns onto a rotating vial of photo-sensitive resin, causing polymerizati
 on where the cumulative dose\nof these patterns reaches the polymerization
  threshold. We formulate the pattern calculation as an inverse light trans
 port problem and solve it via physically based differentiable rendering. I
 n doing so, we address long-standing limitations of prior work by accurate
 ly modeling and correcting\nfor scattering in composite resins, printing i
 n non-symmetric vials, and supporting unusual printing geometries. We also
  introduce an improved discretization scheme that exploits the ray tracing
  operation to mitigate resolution-related artifacts in prints. We demonstr
 ate the benefits of our\nmethod in real-world experiments, where our compu
 ted patterns produce prints with an improved fidelity.\n\nRegistration Cat
 egory: Full Access, Full Access Supporter\n\nLanguage Format: English Lang
 uage\n\nSession Chair: Lin Lu (Shandong University)\n\n
URL:https://asia.siggraph.org/2024/program/?id=papers_448&sess=sess127
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