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X-LIC-LOCATION:Asia/Tokyo
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DTSTAMP:20260817T171536Z
LOCATION:Hall B7 (1)\, B Block\, Level 7
DTSTART;TZID=Asia/Tokyo:20241204T170500
DTEND;TZID=Asia/Tokyo:20241204T171600
UID:siggraphasia_SIGGRAPH Asia 2024_sess123_papers_1180@linklings.com
SUMMARY:Polar Interpolants for Thin-Shell Microstructure Homogenization
DESCRIPTION:Antoine Chan-Lock (Universidad Rey Juan Carlos) and Miguel A. 
 Otaduy (Universidad Rey Juan Carlos, Facebook Reality Labs)\n\nThis paper 
 introduces a new formulation for material homogenization of thin-shell mic
 rostructures. It addresses important challenges that limit the quality of 
 previous approaches: methods that fit the energy response neglect visual i
 mpact, methods that fit the stress response are not conservative, and all 
 of them are limited to a low-dimensional interplay between deformation mod
 es. The new formulation is rooted on the following design principles: the 
 material energy functions are conservative by definition, they are formula
 ted on the high-dimensional membrane and bending domain to capture the com
 plex interplay of the different deformation modes, the material function d
 omain is maximally aligned with the training data, and the material parame
 ters and the optimization are formulated on stress instead of energy for b
 etter correlation with visual impact. The key novelty of our formulation i
 s a new type of high-order RBF interpolant for polar coordinates, which al
 lows us to fulfill all the design principles. We design a material functio
 n using this novel interpolant, as well as an overall homogenization workf
 low. Our results demonstrate very accurate fitting of diverse microstructu
 re behaviors, both quantitatively and qualitatively superior to previous w
 ork.\n\nRegistration Category: Full Access, Full Access Supporter\n\nLangu
 age Format: English Language\n\nSession Chair: Huamin Wang (Style3D Resear
 ch)\n\n
URL:https://asia.siggraph.org/2024/program/?id=papers_1180&sess=sess123
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