BEGIN:VCALENDAR VERSION:2.0 PRODID:Linklings LLC BEGIN:VTIMEZONE TZID:Australia/Melbourne X-LIC-LOCATION:Australia/Melbourne BEGIN:DAYLIGHT TZOFFSETFROM:+1000 TZOFFSETTO:+1100 TZNAME:AEDT DTSTART:19721003T020000 RRULE:FREQ=YEARLY;BYMONTH=4;BYDAY=1SU END:DAYLIGHT BEGIN:STANDARD DTSTART:19721003T020000 TZOFFSETFROM:+1100 TZOFFSETTO:+1000 TZNAME:AEST RRULE:FREQ=YEARLY;BYMONTH=10;BYDAY=1SU END:STANDARD END:VTIMEZONE BEGIN:VEVENT DTSTAMP:20240214T070247Z LOCATION:Meeting Room C4.9+C4.10\, Level 4 (Convention Centre) DTSTART;TZID=Australia/Melbourne:20231214T111000 DTEND;TZID=Australia/Melbourne:20231214T112000 UID:siggraphasia_SIGGRAPH Asia 2023_sess152_papers_995@linklings.com SUMMARY:Close the Design-to-Manufacturing Gap in Computational Optics with a ’Real2Sim’ Learned Two-Photon Neural Lithography Simulator DESCRIPTION:Technical Papers\n\nCheng Zheng (MIT), Guangyuan Zhao (The Chi nese University of Hong Kong), and Peter So (MIT)\n\nWe introduce neural l ithography to address the ‘design-to-manufacturing’ gap in computational o ptics. Computational optics with large design degrees of freedom enable ad vanced functionalities and performance beyond traditional optics. However, the existing design approaches often overlook the numerical modeling of t he manufacturing process, which can result in significant performance devi ation between the design and the fabricated optics. To bridge this gap, we , for the first time, propose a fully differentiable design framework that integrates a pre-trained photolithography simulator into the model-based optical design loop. Leveraging a blend of physics-informed modeling and d ata-driven training using experimentally collected datasets, our photolith ography simulator serves as a regularizer on fabrication feasibility durin g design, compensating for structure discrepancies introduced in the litho graphy process. We demonstrate the effectiveness of our approach through t wo typical tasks in computational optics, where we design and fabricate a holographic optical element (HOE) and a multi-level diffractive lens (MDL) using a two-photon lithography system, showcasing improved optical perfor mance on the task-specific metrics.\n\nRegistration Category: Full Access\ n\nSession Chair: Haisen Zhao (Shandong University) URL:https://asia.siggraph.org/2023/full-program?id=papers_995&sess=sess152 END:VEVENT END:VCALENDAR